Fused silica has a long history of industrial optical application, with its first commercial use dating back to ultrasonic delay lines in 1952. Benefiting from its superior optical transparency, high structural stability, excellent laser damage resistance and scalable manufacturing capability, modern fused silica has b

As a core substrate for high-end optics, semiconductor lithography, and high-energy laser systems, fused silica features ultra-broadband transmittance, ultra-low scattering loss, and excellent laser damage resistance. Compared with conventional optical glasses, fused silica exhibits more stable ultraviolet (UV) and nea

1. IntroductionFused silica (SiO₂) is renowned as one of the highest-quality optical glasses worldwide, benefiting from its superior comprehensive performance . It possesses an ultra-broad high-transmission spectrum spanning deep ultraviolet to infrared bands, alongside prominent advantages including excellent radiati

AbstractBased on the optimal process parameters of NaCl-modified sapphire CMP obtained from preliminary experiments, this work further explores the intrinsic modification mechanism of chloride ions via thermodynamic simulation, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and multiple mic

AbstractSapphire, namely single-crystal α-Al₂O₃, is a high-performance functional substrate extensively utilized in solid-state lasers, semiconductor chips, and gallium nitride-based light-emitting diode (LED) devices, attributed to its exceptional mechanical robustness, optical transparency, chemical inertness

In modern LED chip manufacturing, patterned sapphire substrates (PSS) serve as a core underlying technology that breaks the performance limitations of conventional flat sapphire substrates (FSS). It is widely acknowledged that PSS improves crystal quality by suppressing epitaxial threading dislocations and enhances lig

Nowadays, III-nitride LEDs have become the core of solid-state lighting, display backlighting, and ultraviolet optoelectronic devices. However, traditional LEDs grown on flat sapphire substrates (FSS) are plagued by low luminous efficiency, poor crystal quality, and high device loss, which seriously restrict their perf

Patterned sapphire substrate (PSS) is a critical material for improving the optoelectronic performance of III-nitride light-emitting diodes (LEDs). It effectively reduces the threading dislocation density (TDD) of GaN epitaxial layers, optimizes crystal quality, and enhances the light extraction efficiency (LEE) and li

From Microscopic Damage Evolution to Atomic-Scale Removal Mechanisms
Figure 1. Manufacturing process flow of silicon carbide wafers.
With the rapid growth of new energy vehicles, photovoltaic energy storage, rail transportation, and high-frequency communication industries, silicon carbide (SiC) has emerged as one of th

— Technological Evolution from Conventional Grinding to Atomic-Scale ManufacturingWith the rapid development of new energy vehicles, photovoltaic energy storage, AI servers, and 5G communications, the third-generation semiconductor material—silicon carbide (SiC)—is increasingly becoming a core substra